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Cyclic Plasma Treatment during ALD Hf1-xZrxO2Deposition:
Bhuyian, M. N.
;
Misra, D.
;
Tapily, K.
...
ECS Journal of Solid State Science and Technology. 3 (2014) 5 - p. N83-N88 , 2014
Link:
https://doi.org/10.1149/2.020405jss
RT Journal T1 <Title>Cyclic Plasma Treatment during ALD Hf1-xZrxO2Deposition</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2.020405jss&Exemplar=1&LAN=DE A1 Bhuyian, M. N. A1 Misra, D. A1 Tapily, K. A1 Clark, R. D. A1 Consiglio, S. A1 Wajda, C. S. A1 Nakamura, G. A1 Leusink, G. J. PB The Electrochemical Society YR 2014 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 3 IS 5 SP N83 OP N88 LK http://dx.doi.org/https://doi.org/10.1149/2.020405jss DO https://doi.org/10.1149/2.020405jss SF ELIB - SuUB Bremen
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