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CH4 Concentration Distribution in a Semiconductor Process C..:
Hayashi, Daisuke
;
Nakai, Junya
;
Minami, Masakazu
...
ECS Journal of Solid State Science and Technology. 7 (2018) 11 - p. Q211-Q217 , 2018
Link:
https://doi.org/10.1149/2.0231811jss
RT Journal T1 <Title>CH4 Concentration Distribution in a Semiconductor Process Chamber Measured by the CT-TDLAS</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2.0231811jss&Exemplar=1&LAN=DE A1 Hayashi, Daisuke A1 Nakai, Junya A1 Minami, Masakazu A1 Fujita, Kazuki A1 Kamimoto, Takahiro A1 Deguchi, Yoshihiro PB The Electrochemical Society YR 2018 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 7 IS 11 SP Q211 OP Q217 LK http://dx.doi.org/https://doi.org/10.1149/2.0231811jss DO https://doi.org/10.1149/2.0231811jss SF ELIB - SuUB Bremen
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