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Effect of Various Slurry Injection System Configurations on..:
Han, Ruochen
;
Sampurno, Yasa
;
Bahr, Matthew
...
ECS Journal of Solid State Science and Technology. 6 (2017) 7 - p. P449-P454 , 2017
Link:
https://doi.org/10.1149/2.0311707jss
RT Journal T1
Effect of Various Slurry Injection System Configurations on Removal Rates of Silicon Dioxide Using a Ceria-Based Chemical Mechanical Planarization Slurry
UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2.0311707jss&Exemplar=1&LAN=DE A1 Han, Ruochen A1 Sampurno, Yasa A1 Bahr, Matthew A1 Skillman, Morgan A1 Borucki, Leonard A1 Philipossian, Ara PB The Electrochemical Society YR 2017 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 6 IS 7 SP P449 OP P454 LK http://dx.doi.org/https://doi.org/10.1149/2.0311707jss DO https://doi.org/10.1149/2.0311707jss SF ELIB - SuUB Bremen
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