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Design of a Silicon Carbide Chemical Vapor Deposition React..:
Hayashi, Masaya
;
Mamyouda, Takumi
;
Habuka, Hitoshi
...
ECS Journal of Solid State Science and Technology. 9 (2020) 10 - p. 104008 , 2020
Link:
https://doi.org/10.1149/2162-8777/abc3cf
RT Journal T1 <Title>Design of a Silicon Carbide Chemical Vapor Deposition Reactor Cleaning Process Using Chlorine Trifluoride Gas Accounting for Exothermic Reaction Heat</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2162-8777_abc3cf&Exemplar=1&LAN=DE A1 Hayashi, Masaya A1 Mamyouda, Takumi A1 Habuka, Hitoshi A1 Ishiguro, Akio A1 Ishii, Shigeaki A1 Daigo, Yoshiaki A1 Ito, Hideki A1 Mizushima, Ichiro A1 Takahashi, Yoshinao PB The Electrochemical Society YR 2020 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 9 IS 10 SP 104008 LK http://dx.doi.org/https://doi.org/10.1149/2162-8777/abc3cf DO https://doi.org/10.1149/2162-8777/abc3cf SF ELIB - SuUB Bremen
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