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1 Ergebnisse
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High-Speed Etching of Silicon Carbide Wafer Using High-Pres..:
Sano, Yasuhisa
;
Tajiri, Koki
;
Inoue, Yuki
...
ECS Journal of Solid State Science and Technology. 10 (2021) 1 - p. 014005 , 2021
Link:
https://doi.org/10.1149/2162-8777/abdc47
RT Journal T1 <Title>High-Speed Etching of Silicon Carbide Wafer Using High-Pressure SF6 Plasma</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2162-8777_abdc47&Exemplar=1&LAN=DE A1 Sano, Yasuhisa A1 Tajiri, Koki A1 Inoue, Yuki A1 Mukai, Risa A1 Nakanishi, Yuma A1 Matsuyama, Satoshi A1 Yamauchi, Kazuto PB The Electrochemical Society YR 2021 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 10 IS 1 SP 014005 LK http://dx.doi.org/https://doi.org/10.1149/2162-8777/abdc47 DO https://doi.org/10.1149/2162-8777/abdc47 SF ELIB - SuUB Bremen
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