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Evaluation of Process Damage Induced by Sputtering of Trans..:
Kanai, H.
;
Nishihara, T.
;
Ogura, A.
ECS Journal of Solid State Science and Technology. 10 (2021) 3 - p. 035002 , 2021
Link:
https://doi.org/10.1149/2162-8777/abe8ef
RT Journal T1 <Title>Evaluation of Process Damage Induced by Sputtering of Transparent Conductive Oxide Films for Crystalline Silicon Solar Cells</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2162-8777_abe8ef&Exemplar=1&LAN=DE A1 Kanai, H. A1 Nishihara, T. A1 Ogura, A. PB The Electrochemical Society YR 2021 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 10 IS 3 SP 035002 LK http://dx.doi.org/https://doi.org/10.1149/2162-8777/abe8ef DO https://doi.org/10.1149/2162-8777/abe8ef SF ELIB - SuUB Bremen
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