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Analysis of HfO2 Charge Trapping Layer Characteristics Afte..:
Kim, Jaemin
;
Kim, Jaeun
;
Cho, Eun-Chel
.
ECS Journal of Solid State Science and Technology. 10 (2021) 4 - p. 044003 , 2021
Link:
https://doi.org/10.1149/2162-8777/abf2e0
RT Journal T1 <Title>Analysis of HfO2 Charge Trapping Layer Characteristics After UV Treatment</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2162-8777_abf2e0&Exemplar=1&LAN=DE A1 Kim, Jaemin A1 Kim, Jaeun A1 Cho, Eun-Chel A1 Yi, Junsin PB The Electrochemical Society YR 2021 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 10 IS 4 SP 044003 LK http://dx.doi.org/https://doi.org/10.1149/2162-8777/abf2e0 DO https://doi.org/10.1149/2162-8777/abf2e0 SF ELIB - SuUB Bremen
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