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Characteristics of Silicon Oxide Thin Film Deposited via Re..:
Jung, Chanwon
;
Song, Seokhwi
;
Lee, Namgue
...
ECS Journal of Solid State Science and Technology. 10 (2021) 4 - p. 043005 , 2021
Link:
https://doi.org/10.1149/2162-8777/abf725
RT Journal T1 <Title>Characteristics of Silicon Oxide Thin Film Deposited via Remote Plasma Atomic Layer Deposition</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2162-8777_abf725&Exemplar=1&LAN=DE A1 Jung, Chanwon A1 Song, Seokhwi A1 Lee, Namgue A1 Kim, Youngjoon A1 Lee, Eun Jong A1 Lee, Sung Gwon A1 Jeon, Hyeongtag PB The Electrochemical Society YR 2021 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 10 IS 4 SP 043005 LK http://dx.doi.org/https://doi.org/10.1149/2162-8777/abf725 DO https://doi.org/10.1149/2162-8777/abf725 SF ELIB - SuUB Bremen
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