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1 Ergebnisse
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Radical-Induced Effect on PEALD SiO2 Films by Applying Posi..:
Park, Suhyeon
;
Park, Taehun
;
Choi, Yeongtae
...
ECS Journal of Solid State Science and Technology. 11 (2022) 2 - p. 023007 , 2022
Link:
https://doi.org/10.1149/2162-8777/ac4c9e
RT Journal T1 <Title>Radical-Induced Effect on PEALD SiO2 Films by Applying Positive DC Bias</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2162-8777_ac4c9e&Exemplar=1&LAN=DE A1 Park, Suhyeon A1 Park, Taehun A1 Choi, Yeongtae A1 Jung, Chanwon A1 Kim, Byunguk A1 Jeon, Hyeongtag PB The Electrochemical Society YR 2022 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 11 IS 2 SP 023007 LK http://dx.doi.org/https://doi.org/10.1149/2162-8777/ac4c9e DO https://doi.org/10.1149/2162-8777/ac4c9e SF ELIB - SuUB Bremen
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