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1 Ergebnisse
1
Effect of Hydrogen Plasma Treatment on Atomic Layer Deposit..:
Jung, Chanwon
;
Song, Seokhwi
;
Kim, Jisoo
...
ECS Journal of Solid State Science and Technology. 11 (2022) 6 - p. 063014 , 2022
Link:
https://doi.org/10.1149/2162-8777/ac760f
RT Journal T1 <Title>Effect of Hydrogen Plasma Treatment on Atomic Layer Deposited Silicon Nitride Film</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2162-8777_ac760f&Exemplar=1&LAN=DE A1 Jung, Chanwon A1 Song, Seokhwi A1 Kim, Jisoo A1 Park, Suhyeon A1 Kim, Byunguk A1 Kim, Kyunghoo A1 Jeon, Hyeongtag PB The Electrochemical Society YR 2022 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 11 IS 6 SP 063014 LK http://dx.doi.org/https://doi.org/10.1149/2162-8777/ac760f DO https://doi.org/10.1149/2162-8777/ac760f SF ELIB - SuUB Bremen
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