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1 Ergebnisse
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Effect of Mn-Based Slurries on Chemical Mechanical Polishin..:
Zhao, Panpan
;
Yin, Tao
;
Doi, Toshiro
...
ECS Journal of Solid State Science and Technology. 11 (2022) 7 - p. 074002 , 2022
Link:
https://doi.org/10.1149/2162-8777/ac7bef
RT Journal T1 <Title>Effect of Mn-Based Slurries on Chemical Mechanical Polishing of SiC Substrates</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2162-8777_ac7bef&Exemplar=1&LAN=DE A1 Zhao, Panpan A1 Yin, Tao A1 Doi, Toshiro A1 Kurokawa, Syuhei A1 Seshimo, Kiyoshi A1 Ye, Dongfen A1 Cai, Jianchen PB The Electrochemical Society YR 2022 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 11 IS 7 SP 074002 LK http://dx.doi.org/https://doi.org/10.1149/2162-8777/ac7bef DO https://doi.org/10.1149/2162-8777/ac7bef SF ELIB - SuUB Bremen
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