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Evaluation of Damage in Crystalline Silicon Substrate Induc..:
Kojima, H.
;
Nishihara, T.
;
Gotoh, K.
...
ECS Journal of Solid State Science and Technology. 12 (2023) 1 - p. 015003 , 2023
Link:
https://doi.org/10.1149/2162-8777/acb4bb
RT Journal T1 <Title>Evaluation of Damage in Crystalline Silicon Substrate Induced by Plasma Enhanced Chemical Vapor Deposition of Amorphous Silicon Films</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2162-8777_acb4bb&Exemplar=1&LAN=DE A1 Kojima, H. A1 Nishihara, T. A1 Gotoh, K. A1 Usami, N. A1 Hara, T. A1 Nakamura, K. A1 Ohshita, Y. A1 Ogura, A. PB The Electrochemical Society YR 2023 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 12 IS 1 SP 015003 LK http://dx.doi.org/https://doi.org/10.1149/2162-8777/acb4bb DO https://doi.org/10.1149/2162-8777/acb4bb SF ELIB - SuUB Bremen
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