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1 Ergebnisse
1
Chemically Amplified, Dry-Develop Poly(aldehyde) Photoresis:
Lopez Ninantay, Jose
;
Engler, Anthony
;
Schwartz, Jared
.
ECS Journal of Solid State Science and Technology. 13 (2024) 5 - p. 054004 , 2024
Link:
https://doi.org/10.1149/2162-8777/ad47d0
RT Journal T1 <Title>Chemically Amplified, Dry-Develop Poly(aldehyde) Photoresist</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2162-8777_ad47d0&Exemplar=1&LAN=DE A1 Lopez Ninantay, Jose A1 Engler, Anthony A1 Schwartz, Jared A1 Kohl, Paul A. PB The Electrochemical Society YR 2024 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 13 IS 5 SP 054004 LK http://dx.doi.org/https://doi.org/10.1149/2162-8777/ad47d0 DO https://doi.org/10.1149/2162-8777/ad47d0 SF ELIB - SuUB Bremen
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