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Influence of CoSi Oxidation and Passivation During Silicide..:
Gregoire, Magali
;
Guitton, Barbara
;
Dury, Bastien
...
ECS Journal of Solid State Science and Technology. 13 (2024) 6 - p. 063002 , 2024
Link:
https://doi.org/10.1149/2162-8777/ad4f12
RT Journal T1 <Title>Influence of CoSi Oxidation and Passivation During Silicide Selective Etching on Junction Leakage: Applications to Schottky Diodes Devices</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2162-8777_ad4f12&Exemplar=1&LAN=DE A1 Gregoire, Magali A1 Guitton, Barbara A1 Dury, Bastien A1 Peyrot, Fabien A1 Dreux, Sophie A1 Collonge, Michael A1 Diette, Fréderic PB The Electrochemical Society YR 2024 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 13 IS 6 SP 063002 LK http://dx.doi.org/https://doi.org/10.1149/2162-8777/ad4f12 DO https://doi.org/10.1149/2162-8777/ad4f12 SF ELIB - SuUB Bremen
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