I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
Novel Molecular Photo-resists Based on the Cyclodextrin Der..:
Kudo, Hiroto
;
Inoue, Naomi
;
Nishimura, Isao
.
Bulletin of the Chemical Society of Japan. 78 (2005) 4 - p. 731-737 , 2005
Link:
https://doi.org/10.1246/bcsj.78.731
RT Journal T1 <Title>Novel Molecular Photo-resists Based on the Cyclodextrin Derivatives Containing Fluorine Atoms and t-Butyl Ester Groups</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1246_bcsj.78.731&Exemplar=1&LAN=DE A1 Kudo, Hiroto A1 Inoue, Naomi A1 Nishimura, Isao A1 Nishikubo, Tadatomi PB Oxford University Press (OUP) YR 2005 SN 0009-2673 SN 1348-0634 JF Bulletin of the Chemical Society of Japan VO 78 IS 4 SP 731 OP 737 LK http://dx.doi.org/https://doi.org/10.1246/bcsj.78.731 DO https://doi.org/10.1246/bcsj.78.731 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)
