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1 Ergebnisse
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Chemical Mechanical Polishing for Oxygen Free Copper with M..:
SATO, Ryunosuke
;
ICHIDA, Yoshio
;
MORIMOTO, Yoshitaka
.
Journal of Advanced Mechanical Design, Systems, and Manufacturing. 2 (2008) 4 - p. 685-693 , 2008
Link:
https://doi.org/10.1299/jamdsm.2.685
RT Journal T1 <Title>Chemical Mechanical Polishing for Oxygen Free Copper with Manganese Oxide Abrasives</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1299_jamdsm.2.685&Exemplar=1&LAN=DE A1 SATO, Ryunosuke A1 ICHIDA, Yoshio A1 MORIMOTO, Yoshitaka A1 SHIMIZU, Kenji PB Japan Society of Mechanical Engineers YR 2008 SN 1881-3054 JF Journal of Advanced Mechanical Design, Systems, and Manufacturing VO 2 IS 4 SP 685 OP 693 LK http://dx.doi.org/https://doi.org/10.1299/jamdsm.2.685 DO https://doi.org/10.1299/jamdsm.2.685 SF ELIB - SuUB Bremen
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