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Deposition of SiO_2 films with high laser damage thresholds..:
Alvisi, Marco
;
De Nunzio, Giorgio
;
Di Giulio, Massimo
...
Applied Optics. 38 (1999) 7 - p. 1237 , 1999
Link:
https://doi.org/10.1364/ao.38.001237
RT Journal T1
Deposition of SiO_2 films with high laser damage thresholds by ion-assisted electron-beam evaporation
UL https://suche.suub.uni-bremen.de/peid=cr-10.1364_ao.38.001237&Exemplar=1&LAN=DE A1 Alvisi, Marco A1 De Nunzio, Giorgio A1 Di Giulio, Massimo A1 Ferrara, Maria Cristina A1 Perrone, Maria Rita A1 Protopapa, Lucia A1 Vasanelli, Lorenzo PB Optica Publishing Group YR 1999 SN 0003-6935 SN 1539-4522 JF Applied Optics VO 38 IS 7 SP 1237 LK http://dx.doi.org/https://doi.org/10.1364/ao.38.001237 DO https://doi.org/10.1364/ao.38.001237 SF ELIB - SuUB Bremen
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