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Advances in lithography: introduction to the feature:
Erdmann, Andreas
;
Liang, Rongguang
;
Sezginer, Apo
.
Journal of the Optical Society of America A. 31 (2014) 12 - p. LI1 , 2014
Link:
https://doi.org/10.1364/josaa.31.000li1
RT Journal T1 <Title>Advances in lithography: introduction to the feature</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1364_josaa.31.000li1&Exemplar=1&LAN=DE A1 Erdmann, Andreas A1 Liang, Rongguang A1 Sezginer, Apo A1 Smith, Bruce PB Optica Publishing Group YR 2014 SN 1084-7529 SN 1520-8532 JF Journal of the Optical Society of America A VO 31 IS 12 SP LI1 LK http://dx.doi.org/https://doi.org/10.1364/josaa.31.000li1 DO https://doi.org/10.1364/josaa.31.000li1 SF ELIB - SuUB Bremen
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