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1 Ergebnisse
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Extreme-ultraviolet microexposure tool at 05 NA for sub-16 ..:
Goldstein, Michael
;
Hudyma, Russ
;
Naulleau, Patrick
.
Optics Letters. 33 (2008) 24 - p. 2995 , 2008
Link:
https://doi.org/10.1364/ol.33.002995
RT Journal T1
Extreme-ultraviolet microexposure tool at 05 NA for sub-16 nm lithography
UL https://suche.suub.uni-bremen.de/peid=cr-10.1364_ol.33.002995&Exemplar=1&LAN=DE A1 Goldstein, Michael A1 Hudyma, Russ A1 Naulleau, Patrick A1 Wurm, Stefan PB Optica Publishing Group YR 2008 SN 0146-9592 SN 1539-4794 JF Optics Letters VO 33 IS 24 SP 2995 LK http://dx.doi.org/https://doi.org/10.1364/ol.33.002995 DO https://doi.org/10.1364/ol.33.002995 SF ELIB - SuUB Bremen
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