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1 Ergebnisse
1
Fullerene-assisted electron-beam lithography for pattern im..:
Jiao, Yuqing
;
Pello, Josselin
;
Mejia, Alonso Millan
...
Optics Letters. 39 (2014) 6 - p. 1645 , 2014
Link:
https://doi.org/10.1364/ol.39.001645
RT Journal T1
Fullerene-assisted electron-beam lithography for pattern improvement and loss reduction in InP membrane waveguide devices
UL https://suche.suub.uni-bremen.de/peid=cr-10.1364_ol.39.001645&Exemplar=1&LAN=DE A1 Jiao, Yuqing A1 Pello, Josselin A1 Mejia, Alonso Millan A1 Shen, Longfei A1 Smalbrugge, Barry A1 Geluk, Erik Jan A1 Smit, Meint A1 van der Tol, Jos PB Optica Publishing Group YR 2014 SN 0146-9592 SN 1539-4794 JF Optics Letters VO 39 IS 6 SP 1645 LK http://dx.doi.org/https://doi.org/10.1364/ol.39.001645 DO https://doi.org/10.1364/ol.39.001645 SF ELIB - SuUB Bremen
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