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1 Ergebnisse
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Photoelectron Nano-spectroscopy of Reactive Ion Etching-Ind..:
Oshima, Masaharu
;
Mori, Daisuke
;
Takigawa, Aki
...
e-Journal of Surface Science and Nanotechnology. 16 (2018) 0 - p. 257-261 , 2018
Link:
https://doi.org/10.1380/ejssnt.2018.257
RT Journal T1 <Title>Photoelectron Nano-spectroscopy of Reactive Ion Etching-Induced Damages to the Trench Sidewalls and Bottoms of 4H-SiC Trench-MOSFETs</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1380_ejssnt.2018.257&Exemplar=1&LAN=DE A1 Oshima, Masaharu A1 Mori, Daisuke A1 Takigawa, Aki A1 Otsuki, Akihiko A1 Nagamura, Naoka A1 Konno, Shun A1 Takahashi, Yoshinobu A1 Kotsugi, Masato A1 Nohira, Hiroshi PB Surface Science Society Japan YR 2018 SN 1348-0391 JF e-Journal of Surface Science and Nanotechnology VO 16 IS 0 SP 257 OP 261 LK http://dx.doi.org/https://doi.org/10.1380/ejssnt.2018.257 DO https://doi.org/10.1380/ejssnt.2018.257 SF ELIB - SuUB Bremen
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