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RAPID THERMAL PROCESSING FOR VLSI APPLICATION:
, In:
EPM 87. Energy Pulse and Particle Beam Modification of Materials
,
Wieser, E.
;
Gerisch, D
;
Kahlert, V.
- p. 80-86 , 1988
Link:
https://doi.org/10.1515/9783112611203-011
RT T1 <cTitle>EPM 87. Energy Pulse and Particle Beam Modification of Materials</cTitle>: T1 <Title>RAPID THERMAL PROCESSING FOR VLSI APPLICATION</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1515_9783112611203-011&Exemplar=1&LAN=DE A1 Wieser, E. A1 Gerisch, D A1 Kahlert, V. PB De Gruyter YR 1988 SP 80 OP 86 LK http://dx.doi.org/https://doi.org/10.1515/9783112611203-011 DO https://doi.org/10.1515/9783112611203-011 SF ELIB - SuUB Bremen
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