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1
HIGH ENERGY IMPLANTATION AND ANNEALING OF PHOSPHORUS IN SIL..:
, In:
EPM 87. Energy Pulse and Particle Beam Modification of Materials
,
Skorupa, W.
;
Wieser, E.
;
Grötzschel, R.
... - p. 161-163 , 1988
Link:
https://doi.org/10.1515/9783112611203-025
RT T1 <cTitle>EPM 87. Energy Pulse and Particle Beam Modification of Materials</cTitle>: T1 <Title>HIGH ENERGY IMPLANTATION AND ANNEALING OF PHOSPHORUS IN SILICON</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1515_9783112611203-025&Exemplar=1&LAN=DE A1 Skorupa, W. A1 Wieser, E. A1 Grötzschel, R. A1 Posselt, M. A1 Armigliato, A. A1 Garulli, A. A1 Bèyer, A. A1 Markgraf, W PB De Gruyter YR 1988 SP 161 OP 163 LK http://dx.doi.org/https://doi.org/10.1515/9783112611203-025 DO https://doi.org/10.1515/9783112611203-025 SF ELIB - SuUB Bremen
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