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1
FORMATION OF BURIED SILICON NITRIDE AND OXYNITRIDE LAYERS I..:
, In:
EPM 87. Energy Pulse and Particle Beam Modification of Materials
,
Skorupa, W.
;
Wollschlager, K.
;
Voelskow, M
... - p. 427-429 , 1988
Link:
https://doi.org/10.1515/9783112611203-109
RT T1 <cTitle>EPM 87. Energy Pulse and Particle Beam Modification of Materials</cTitle>: T1 <Title>FORMATION OF BURIED SILICON NITRIDE AND OXYNITRIDE LAYERS IN SILICON BY ION BEAM SYNTHESIS</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1515_9783112611203-109&Exemplar=1&LAN=DE A1 Skorupa, W. A1 Wollschlager, K. A1 Voelskow, M A1 Bartsch, H. A1 Albrecht, O. A1 Gotz, J. PB De Gruyter YR 1988 SP 427 OP 429 LK http://dx.doi.org/https://doi.org/10.1515/9783112611203-109 DO https://doi.org/10.1515/9783112611203-109 SF ELIB - SuUB Bremen
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