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Phase formation and stability in TiO x and ZrO x thin films..:
Henning, Ralph A.
;
Leichtweiss, Thomas
;
Dorow-Gerspach, Daniel
...
Zeitschrift für Kristallographie - Crystalline Materials. 232 (2017) 1-3 - p. 161-183 , 2017
Link:
https://doi.org/10.1515/zkri-2016-1981
RT Journal T1 <Title>Phase formation and stability in TiO x and ZrO x thin films: Extremely sub-stoichiometric functional oxides for electrical and TCO applications</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1515_zkri-2016-1981&Exemplar=1&LAN=DE A1 Henning, Ralph A. A1 Leichtweiss, Thomas A1 Dorow-Gerspach, Daniel A1 Schmidt, Rüdiger A1 Wolff, Niklas A1 Schürmann, Ulrich A1 Decker, Yannic A1 Kienle, Lorenz A1 Wuttig, Matthias A1 Janek, Jürgen PB Walter de Gruyter GmbH YR 2017 SN 2196-7105 SN 2194-4946 JF Zeitschrift für Kristallographie - Crystalline Materials VO 232 IS 1-3 SP 161 OP 183 LK http://dx.doi.org/https://doi.org/10.1515/zkri-2016-1981 DO https://doi.org/10.1515/zkri-2016-1981 SF ELIB - SuUB Bremen
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