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1 Ergebnisse
1
CMP Challenges for Advanced Technology Nodes beyond Si:
Zhang, John H
;
Tsai, Stan
;
Surisetty, Charan
...
MRS Advances. 2 (2017) 51 - p. 2891-2902 , 2017
Link:
https://doi.org/10.1557/adv.2017.339
RT Journal T1
CMP Challenges for Advanced Technology Nodes beyond Si
UL https://suche.suub.uni-bremen.de/peid=cr-10.1557_adv.2017.339&Exemplar=1&LAN=DE A1 Zhang, John H A1 Tsai, Stan A1 Surisetty, Charan A1 Fronheiser, Jody A1 Siddiqui, Shariq A1 Bentley, Steven A1 Patlolla, Raghuveer A1 Canaperi, Donald F. A1 Kleemeier, Walter A1 Labelle, Cathy PB Springer Science and Business Media LLC YR 2017 SN 2059-8521 JF MRS Advances VO 2 IS 51 SP 2891 OP 2902 LK http://dx.doi.org/https://doi.org/10.1557/adv.2017.339 DO https://doi.org/10.1557/adv.2017.339 SF ELIB - SuUB Bremen
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