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Heteroepitaxial growth of 3C–SiC film on Si(100) substrate ..:
Morikawa, Y.
;
Hirai, M.
;
Ohi, A.
..
Journal of Materials Research. 22 (2007) 5 - p. 1275-1280 , 2007
Link:
https://doi.org/10.1557/jmr.2007.0151
RT Journal T1 <Title>Heteroepitaxial growth of 3C–SiC film on Si(100) substrate by plasma chemical vapor deposition using monomethylsilane</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1557_jmr.2007.0151&Exemplar=1&LAN=DE A1 Morikawa, Y. A1 Hirai, M. A1 Ohi, A. A1 Kusaka, M. A1 Iwami, M. PB Springer Science and Business Media LLC YR 2007 SN 0884-2914 SN 2044-5326 JF Journal of Materials Research VO 22 IS 5 SP 1275 OP 1280 LK http://dx.doi.org/https://doi.org/10.1557/jmr.2007.0151 DO https://doi.org/10.1557/jmr.2007.0151 SF ELIB - SuUB Bremen
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