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1 Ergebnisse
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Micro-Raman characterization of Ge diffusion and Si stress ..:
Chang, Chun-Wei
;
Hong, Min-Hao
;
Lee, Wei-Fan
...
Journal of Materials Research. 27 (2012) 9 - p. 1314-1323 , 2012
Link:
https://doi.org/10.1557/jmr.2012.88
RT Journal T1
Micro-Raman characterization of Ge diffusion and Si stress change in thin epitaxial Si1−xGex layers on Si(100) after rapid thermal annealing
UL https://suche.suub.uni-bremen.de/peid=cr-10.1557_jmr.2012.88&Exemplar=1&LAN=DE A1 Chang, Chun-Wei A1 Hong, Min-Hao A1 Lee, Wei-Fan A1 Lee, Kuan-Ching A1 Tseng, Li-De A1 Chen, Yi-Hann A1 Chuang, Yen A1 Fan, Yu-Ta A1 Ueda, Takeshi A1 Ishigaki, Toshikazu A1 Kang, Kitaek A1 Yoo, Woo Sik PB Springer Science and Business Media LLC YR 2012 SN 0884-2914 SN 2044-5326 JF Journal of Materials Research VO 27 IS 9 SP 1314 OP 1323 LK http://dx.doi.org/https://doi.org/10.1557/jmr.2012.88 DO https://doi.org/10.1557/jmr.2012.88 SF ELIB - SuUB Bremen
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