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1 Ergebnisse
1
Scratch-concerned yield modeling for IC manufacturing invol..:
Zhu, Jiao-jiao
;
Luo, Xiao-hua
;
Chen, Li-sheng
..
Journal of Zhejiang University SCIENCE C. 13 (2012) 5 - p. 376-384 , 2012
Link:
https://doi.org/10.1631/jzus.c1100242
RT Journal T1 <Title>Scratch-concerned yield modeling for IC manufacturing involved with a chemical mechanical polishing process</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1631_jzus.c1100242&Exemplar=1&LAN=DE A1 Zhu, Jiao-jiao A1 Luo, Xiao-hua A1 Chen, Li-sheng A1 Ye, Yi A1 Yan, Xiao-lang PB Zhejiang University Press YR 2012 SN 1869-1951 SN 1869-196X JF Journal of Zhejiang University SCIENCE C VO 13 IS 5 SP 376 OP 384 LK http://dx.doi.org/https://doi.org/10.1631/jzus.c1100242 DO https://doi.org/10.1631/jzus.c1100242 SF ELIB - SuUB Bremen
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