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Solution‐processed oxide thin‐film transistors using alumin..:
Jeong, Woong Hee
;
Bae, Jung Hyeon
;
Kim, Kyung Min
...
Journal of the Society for Information Display. 19 (2011) 9 - p. 620-622 , 2011
Link:
https://doi.org/10.1889/jsid19.9.620
RT Journal T1
Solution‐processed oxide thin‐film transistors using aluminum and nitrate precursors for low‐temperature annealing
UL https://suche.suub.uni-bremen.de/peid=cr-10.1889_jsid19.9.620&Exemplar=1&LAN=DE A1 Jeong, Woong Hee A1 Bae, Jung Hyeon A1 Kim, Kyung Min A1 Kim, Dong Lim A1 Rim, You Seung A1 Kim, Si Joon A1 Park, Kyung‐Bae A1 Seon, Jong‐Baek A1 Ryu, Myung‐Kwan A1 Kim, Hyun Jae PB Wiley YR 2011 SN 1071-0922 SN 1938-3657 JF Journal of the Society for Information Display VO 19 IS 9 SP 620 OP 622 LK http://dx.doi.org/https://doi.org/10.1889/jsid19.9.620 DO https://doi.org/10.1889/jsid19.9.620 SF ELIB - SuUB Bremen
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