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Atomic layer deposition of HfO2 on graphene from HfCl4 and ..:
Alles, Harry
;
Aarik, Jaan
;
Aidla, Aleks
...
Open Physics. 9 (2011) 2 - p. 319-324 , 2011
Link:
https://doi.org/10.2478/s11534-010-0040-x
RT Journal T1
Atomic layer deposition of HfO2 on graphene from HfCl4 and H2O
UL https://suche.suub.uni-bremen.de/peid=cr-10.2478_s11534-010-0040-x&Exemplar=1&LAN=DE A1 Alles, Harry A1 Aarik, Jaan A1 Aidla, Aleks A1 Fay, Aurelien A1 Kozlova, Jekaterina A1 Niilisk, Ahti A1 Pärs, Martti A1 Rähn, Mihkel A1 Wiesner, Maciej A1 Hakonen, Pertti A1 Sammelselg, Väino PB Walter de Gruyter GmbH YR 2011 SN 2391-5471 JF Open Physics VO 9 IS 2 SP 319 OP 324 LK http://dx.doi.org/https://doi.org/10.2478/s11534-010-0040-x DO https://doi.org/10.2478/s11534-010-0040-x SF ELIB - SuUB Bremen
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