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Bottom Anti-Reflective Coatings for DUV Lithography:
Kang, Wen-Bing
;
Tanaka, Hatsuyuki
;
Kimura, Ken
...
Journal of Photopolymer Science and Technology. 10 (1997) 3 - p. 471-477 , 1997
Link:
https://doi.org/10.2494/photopolymer.10.471
RT Journal T1 <Title>Bottom Anti-Reflective Coatings for DUV Lithography</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.10.471&Exemplar=1&LAN=DE A1 Kang, Wen-Bing A1 Tanaka, Hatsuyuki A1 Kimura, Ken A1 Padmanaban, Munirathna A1 Funato, Satoru A1 Kinoshita, Yoshiaki A1 Kudo, Takanori A1 Nozaki, Yuko A1 Pawlowski, Georg PB Technical Association of Photopolymers, Japan YR 1997 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 10 IS 3 SP 471 OP 477 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.10.471 DO https://doi.org/10.2494/photopolymer.10.471 SF ELIB - SuUB Bremen
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