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Study of Copolymer Properties for ArF Excimer Laser Resists:
Asakawa, Koji
;
Ushirogouchi, Tohru
;
Shida, Naomi
..
Journal of Photopolymer Science and Technology. 10 (1997) 4 - p. 559-560 , 1997
Link:
https://doi.org/10.2494/photopolymer.10.559
RT Journal T1 <Title>Study of Copolymer Properties for ArF Excimer Laser Resists</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.10.559&Exemplar=1&LAN=DE A1 Asakawa, Koji A1 Ushirogouchi, Tohru A1 Shida, Naomi A1 Okino, Takeshi A1 Nakase, Makoto PB Technical Association of Photopolymers, Japan YR 1997 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 10 IS 4 SP 559 OP 560 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.10.559 DO https://doi.org/10.2494/photopolymer.10.559 SF ELIB - SuUB Bremen
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