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1 Ergebnisse
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Resists Using the Absorption Band Shift Method for ArF Exci..:
Okino, Takeshi
;
Asakawa, Koji
;
Shida, Naomi
.
Journal of Photopolymer Science and Technology. 11 (1998) 3 - p. 489-492 , 1998
Link:
https://doi.org/10.2494/photopolymer.11.489
RT Journal T1 <Title>Resists Using the Absorption Band Shift Method for ArF Excimer Laser Lithography</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.11.489&Exemplar=1&LAN=DE A1 Okino, Takeshi A1 Asakawa, Koji A1 Shida, Naomi A1 Ushirogouchi, Tohru PB Technical Association of Photopolymers, Japan YR 1998 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 11 IS 3 SP 489 OP 492 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.11.489 DO https://doi.org/10.2494/photopolymer.11.489 SF ELIB - SuUB Bremen
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