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1 Ergebnisse
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Negative EB Resist Materials Using Anisotropic Acid-Diffusi..:
Uchino, Shou-ichi
;
Yamamoto, Jiro
;
Migitaka, Sonoko
...
Journal of Photopolymer Science and Technology. 11 (1998) 4 - p. 555-563 , 1998
Link:
https://doi.org/10.2494/photopolymer.11.555
RT Journal T1 <Title>Negative EB Resist Materials Using Anisotropic Acid-Diffusion Based on Acid-Catalyzed Dehydration of Phenylcarbinols</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.11.555&Exemplar=1&LAN=DE A1 Uchino, Shou-ichi A1 Yamamoto, Jiro A1 Migitaka, Sonoko A1 Kojima, Kyoko A1 Hashimoto, Michiaki A1 Murai, Fumio A1 Shiraishi, Hiroshi PB Technical Association of Photopolymers, Japan YR 1998 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 11 IS 4 SP 555 OP 563 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.11.555 DO https://doi.org/10.2494/photopolymer.11.555 SF ELIB - SuUB Bremen
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