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Etch Selectivity of 4SiMA:Hydroxystyrene Based Copolymers. ..:
Wallraff, G. M.
;
Larson, C. E.
;
Sooriyakumaran, R.
...
Journal of Photopolymer Science and Technology. 11 (1998) 4 - p. 673-679 , 1998
Link:
https://doi.org/10.2494/photopolymer.11.673
RT Journal T1 <Title>Etch Selectivity of 4SiMA:Hydroxystyrene Based Copolymers. Silicon Chemistry for Bilayer Resist Systems</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.11.673&Exemplar=1&LAN=DE A1 Wallraff, G. M. A1 Larson, C. E. A1 Sooriyakumaran, R. A1 Opitz, J. A1 Fenzel-Alexander, D. A1 DiPietro, R. A1 Hofer, D. A1 Breyta, G. A1 Sherwood, M. A1 Muete, J. A1 Lin, Q. A1 LaTulip, D. A1 Simons, J. A1 Babich, K. A1 Petrillo, K. A1 Angelopoulos, M. PB Technical Association of Photopolymers, Japan YR 1998 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 11 IS 4 SP 673 OP 679 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.11.673 DO https://doi.org/10.2494/photopolymer.11.673 SF ELIB - SuUB Bremen
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