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Negative Electron Beam Resists Using Ring-Chain Tautomerism..:
Uchino, Shou-ichi
;
Kimura, Kaori
Journal of Photopolymer Science and Technology. 12 (1999) 2 - p. 359-364 , 1999
Link:
https://doi.org/10.2494/photopolymer.12.359
RT Journal T1 <Title>Negative Electron Beam Resists Using Ring-Chain Tautomerism of Benzoic Acid Derivatives</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.12.359&Exemplar=1&LAN=DE A1 Uchino, Shou-ichi A1 Kimura, Kaori PB Technical Association of Photopolymers, Japan YR 1999 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 12 IS 2 SP 359 OP 364 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.12.359 DO https://doi.org/10.2494/photopolymer.12.359 SF ELIB - SuUB Bremen
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