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1 Ergebnisse
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Synthesis of 2-Phenylallyl-ended Ply(.ALPHA.-Methylstyrene)..:
Hirakawa, Naoki
;
Tokuda, Takashi
;
Aoki, Hidetoshi
..
Journal of Photopolymer Science and Technology. 12 (1999) 2 - p. 365-368 , 1999
Link:
https://doi.org/10.2494/photopolymer.12.365
RT Journal T1 <Title>Synthesis of 2-Phenylallyl-ended Ply(.ALPHA.-Methylstyrene) and Application for Electron-Beam Resist</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.12.365&Exemplar=1&LAN=DE A1 Hirakawa, Naoki A1 Tokuda, Takashi A1 Aoki, Hidetoshi A1 Nagasaki, Yukio A1 Kato, Masao PB Technical Association of Photopolymers, Japan YR 1999 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 12 IS 2 SP 365 OP 368 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.12.365 DO https://doi.org/10.2494/photopolymer.12.365 SF ELIB - SuUB Bremen
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