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1 Ergebnisse
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Nano-scale Fabrication by AFM Lithography Using a Constant-..:
Ishibashi, Masayoshi
;
Heike, Seiji
;
Sugita, Nami
..
Journal of Photopolymer Science and Technology. 12 (1999) 2 - p. 373-374 , 1999
Link:
https://doi.org/10.2494/photopolymer.12.373
RT Journal T1 <Title>Nano-scale Fabrication by AFM Lithography Using a Constant-current-control Exposure System</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.12.373&Exemplar=1&LAN=DE A1 Ishibashi, Masayoshi A1 Heike, Seiji A1 Sugita, Nami A1 Kajiyama, Hiroshi A1 Hashizume, Tomihiro PB Technical Association of Photopolymers, Japan YR 1999 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 12 IS 2 SP 373 OP 374 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.12.373 DO https://doi.org/10.2494/photopolymer.12.373 SF ELIB - SuUB Bremen
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