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1 Ergebnisse
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193nm Lithography with Novel Highly Transparent Acid Amplif..:
Naito, Takuya
;
Ohfuji, Takeshi
;
Endo, Masayuki
...
Journal of Photopolymer Science and Technology. 12 (1999) 3 - p. 509-514 , 1999
Link:
https://doi.org/10.2494/photopolymer.12.509
RT Journal T1 <Title>193nm Lithography with Novel Highly Transparent Acid Amplifier for Chemically Amplified Resist</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.12.509&Exemplar=1&LAN=DE A1 Naito, Takuya A1 Ohfuji, Takeshi A1 Endo, Masayuki A1 Morimoto, Hiroaki A1 Arimitsu, Koji A1 Ichimura, Kunihiro PB Technical Association of Photopolymers, Japan YR 1999 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 12 IS 3 SP 509 OP 514 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.12.509 DO https://doi.org/10.2494/photopolymer.12.509 SF ELIB - SuUB Bremen
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