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1 Ergebnisse
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Post-Exposure Bake Temperature Considerations for High Acti..:
Malik, Sanjay
;
Eisele, Jeff
;
Whewell, Allyn
...
Journal of Photopolymer Science and Technology. 13 (2000) 4 - p. 513-518 , 2000
Link:
https://doi.org/10.2494/photopolymer.13.513
RT Journal T1 <Title>Post-Exposure Bake Temperature Considerations for High Activation Energy Resist Systems</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.13.513&Exemplar=1&LAN=DE A1 Malik, Sanjay A1 Eisele, Jeff A1 Whewell, Allyn A1 Ferreira, Lawrence A1 Holt, Timothy A1 Bowden, Murrae PB Technical Association of Photopolymers, Japan YR 2000 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 13 IS 4 SP 513 OP 518 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.13.513 DO https://doi.org/10.2494/photopolymer.13.513 SF ELIB - SuUB Bremen
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