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Bilayer resists for DUV lithography:
Tai, M. C.
;
Fang, M. C.
;
Chang, J. F.
...
Journal of Photopolymer Science and Technology. 13 (2000) 4 - p. 525-529 , 2000
Link:
https://doi.org/10.2494/photopolymer.13.525
RT Journal T1 <Title>Bilayer resists for DUV lithography</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.13.525&Exemplar=1&LAN=DE A1 Tai, M. C. A1 Fang, M. C. A1 Chang, J. F. A1 Lin, T. Y. A1 Liu, T. C. A1 Chuang, C. S. A1 Cheng, H. B. A1 Jean, T. S. PB Technical Association of Photopolymers, Japan YR 2000 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 13 IS 4 SP 525 OP 529 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.13.525 DO https://doi.org/10.2494/photopolymer.13.525 SF ELIB - SuUB Bremen
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