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Advanced Materials for 193-nm Resists:
Shida, Naomi
;
Ushirogouchi, Tohru
;
Asakawa, Koji
...
Journal of Photopolymer Science and Technology. 13 (2000) 4 - p. 601-606 , 2000
Link:
https://doi.org/10.2494/photopolymer.13.601
RT Journal T1 <Title>Advanced Materials for 193-nm Resists</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.13.601&Exemplar=1&LAN=DE A1 Shida, Naomi A1 Ushirogouchi, Tohru A1 Asakawa, Koji A1 Okino, Takeshi A1 Saito, Satoshi A1 Funaki, Yoshinori A1 Takaragi, Akira A1 Tsutsumi, Kiyoharu A1 Inoue, Keizo A1 Nakano, Tatsuya PB Technical Association of Photopolymers, Japan YR 2000 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 13 IS 4 SP 601 OP 606 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.13.601 DO https://doi.org/10.2494/photopolymer.13.601 SF ELIB - SuUB Bremen
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