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Layer-Specific Resists for 193nm Lithography:
Padmanaban, Munirathna
;
Bae, Jun-Bom
;
Kim, Woo-Kyu
...
Journal of Photopolymer Science and Technology. 13 (2000) 4 - p. 607-615 , 2000
Link:
https://doi.org/10.2494/photopolymer.13.607
RT Journal T1 <Title>Layer-Specific Resists for 193nm Lithography</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.13.607&Exemplar=1&LAN=DE A1 Padmanaban, Munirathna A1 Bae, Jun-Bom A1 Kim, Woo-Kyu A1 Kudo, Takanori A1 Rahman, M. Dalil A1 Dammel, Ralph R. PB Technical Association of Photopolymers, Japan YR 2000 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 13 IS 4 SP 607 OP 615 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.13.607 DO https://doi.org/10.2494/photopolymer.13.607 SF ELIB - SuUB Bremen
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