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1 Ergebnisse
1
Sensitized Transparent Photobase Additive For 193 nm Lithog..:
Padmanaban, Munirathna
;
Bae, Jun-Born
;
Cook, Michelle
...
Journal of Photopolymer Science and Technology. 13 (2000) 4 - p. 617-624 , 2000
Link:
https://doi.org/10.2494/photopolymer.13.617
RT Journal T1
Sensitized Transparent Photobase Additive For 193 nm Lithography
UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.13.617&Exemplar=1&LAN=DE A1 Padmanaban, Munirathna A1 Bae, Jun-Born A1 Cook, Michelle A1 Kim, Woo-Kyu A1 Klauck-Jacobs, Axel A1 Kudo, Takanori A1 Rahman, M. Dalil A1 Dammel, Ralph R A1 Byers, Jeffrey D. PB Technical Association of Photopolymers, Japan YR 2000 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 13 IS 4 SP 617 OP 624 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.13.617 DO https://doi.org/10.2494/photopolymer.13.617 SF ELIB - SuUB Bremen
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