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1 Ergebnisse
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A New 193 nm Single Layer Resist Based on Cycloolefin Malei..:
Lee, Si-Hyeung
;
Kwon, Ki-Young
;
Jung, Dong-Won
...
Journal of Photopolymer Science and Technology. 13 (2000) 4 - p. 651-656 , 2000
Link:
https://doi.org/10.2494/photopolymer.13.651
RT Journal T1 <Title>A New 193 nm Single Layer Resist Based on Cycloolefin Maleic Anhydride Polymers</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.13.651&Exemplar=1&LAN=DE A1 Lee, Si-Hyeung A1 Kwon, Ki-Young A1 Jung, Dong-Won A1 Lee, Sook A1 Yoon, Kwang-Sub A1 Kim, Hyun-Woo A1 Choi, Sang-Jun A1 Woo, Sang-Gyun A1 Moon, Joo-Tae PB Technical Association of Photopolymers, Japan YR 2000 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 13 IS 4 SP 651 OP 656 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.13.651 DO https://doi.org/10.2494/photopolymer.13.651 SF ELIB - SuUB Bremen
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