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Mechanistic Studies on the CD Degradation of 193nm Resists ..:
Kudo, Takanori
;
Dammel, Ralph R.
;
Bae, Jun-Born
...
Journal of Photopolymer Science and Technology. 14 (2001) 3 - p. 407-417 , 2001
Link:
https://doi.org/10.2494/photopolymer.14.407
RT Journal T1 <Title>Mechanistic Studies on the CD Degradation of 193nm Resists during SEM Inspection</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.14.407&Exemplar=1&LAN=DE A1 Kudo, Takanori A1 Dammel, Ralph R. A1 Bae, Jun-Born A1 Rahman, M. Dalil A1 Kim, Woo-Kyu A1 McKenzie, Douglas A1 Alemy, Eric L. A1 Ng, Waiman A1 Padmanaban, Munirathna PB Technical Association of Photopolymers, Japan YR 2001 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 14 IS 3 SP 407 OP 417 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.14.407 DO https://doi.org/10.2494/photopolymer.14.407 SF ELIB - SuUB Bremen
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