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Mold Surface Treatment for Imprint Lithography:
Hirai, Yoshihiko
;
Yoshida, Satoshi
;
Okamoto, Akio
...
Journal of Photopolymer Science and Technology. 14 (2001) 3 - p. 457-462 , 2001
Link:
https://doi.org/10.2494/photopolymer.14.457
RT Journal T1 <Title>Mold Surface Treatment for Imprint Lithography</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.14.457&Exemplar=1&LAN=DE A1 Hirai, Yoshihiko A1 Yoshida, Satoshi A1 Okamoto, Akio A1 Tanaka, Yoshio A1 Endo, Masataka A1 Irie, Sigeo A1 Nakagawa, Hideo A1 Sasago, Masaru PB Technical Association of Photopolymers, Japan YR 2001 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 14 IS 3 SP 457 OP 462 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.14.457 DO https://doi.org/10.2494/photopolymer.14.457 SF ELIB - SuUB Bremen
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