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The Resist Property of Fluoropolymer for 157-nm Lithography:
Ishikawa, Seiichi
;
Toriumi, Minoru
;
Miyoshi, Seiro
...
Journal of Photopolymer Science and Technology. 14 (2001) 4 - p. 595-601 , 2001
Link:
https://doi.org/10.2494/photopolymer.14.595
RT Journal T1 <Title>The Resist Property of Fluoropolymer for 157-nm Lithography</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.14.595&Exemplar=1&LAN=DE A1 Ishikawa, Seiichi A1 Toriumi, Minoru A1 Miyoshi, Seiro A1 Naito, Takuya A1 Yamazaki, Tamio A1 Watanabe, Manabu A1 Itani, Toshio PB Technical Association of Photopolymers, Japan YR 2001 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 14 IS 4 SP 595 OP 601 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.14.595 DO https://doi.org/10.2494/photopolymer.14.595 SF ELIB - SuUB Bremen
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