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Etch Properties of 193nm Resists: Issues and Approaches:
Padmanaban, Munirathna
;
Alemy, Eric
;
Dammel, Ralph
...
Journal of Photopolymer Science and Technology. 15 (2002) 3 - p. 521-527 , 2002
Link:
https://doi.org/10.2494/photopolymer.15.521
RT Journal T1 <Title>Etch Properties of 193nm Resists: Issues and Approaches</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.15.521&Exemplar=1&LAN=DE A1 Padmanaban, Munirathna A1 Alemy, Eric A1 Dammel, Ralph A1 Kim, Woo-Kyu A1 Kudo, Takanori A1 Lee, SangHo A1 Rahman, Dalil A1 Chen, Wan-Lin A1 Sadjadi, Reza M. A1 Livesay, William A1 Ross, Matthew PB Technical Association of Photopolymers, Japan YR 2002 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 15 IS 3 SP 521 OP 527 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.15.521 DO https://doi.org/10.2494/photopolymer.15.521 SF ELIB - SuUB Bremen
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